Work in marking in XPS

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Aug 6th, 2022
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How to work in marking in XPS

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hi and welcome to this presentation on sample handling preparation and mounting for xps and other surface analysis methods and i want to first thank the organizers for inviting me to talk at this workshop this talk is based primarily on two references which are part of a collection internal vacuum science and technology and this particular set is referenced as you can see with this notation here and the idea is to help educate people with regard to various aspects of xps and prevent problems with bad information thatamp;#39;s gotten out of literature the first paper is a sample preparation and mounting technique paper and the other authors are roberto garcia of nc state jeff schallenberger from the penn state university john newman from physical electronics and kerry donnelly from university of north carolina the other paper was put together by carrie donnelly and i and is an introduction to xps why are we doing this talk well surface analysis requires surfaces that have not been comp

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XPS stands for XML Paper Specification. Thats because it contains page layout information written in the XML page description language. Essentially, this type of language describes the structure and content of a document, including its layout and appearance, making it suited for printing for example.
XPS is a powerful measurement technique because it not only shows what elements are present, but also what other elements they are bonded to. The technique can be used in line profiling of the elemental composition across the surface, or in depth profiling when paired with ion-beam etching.
The main cause of the peak shift in XPS spectra is mostly related to chemical shifts due to the presence or absence of the chemical states of the element having different formal oxidation state. And the intensity may also be changed bcos it is directly linked to the number of atoms in the respective chemical state.
XPS is routinely used to determine a) the composition of material surfaces (elemental identification), the relative abundances of these components on surfaces (semi-quantitative analysis), and c) the chemical state of polyvalent ions by measuring the binding energies of elements, which is related to the nature and
X-ray photoelectron spectroscopy (XPS), also known as electron spectroscopy for chemical analysis (ESCA), is a technique for analyzing a materials surface chemistry. XPS can measure elemental composition as well as the chemical and electronic state of the atoms within a material.
The work function refers to removal of an electron to a position that is far enough from the surface (many nm) that the force between the electron and its image charge in the surface can be neglected.
It is a quantitative spectroscopic technique which utilises core level shift to obtain information on the chemical and electronic state of a samples elemental components to a penetration depth of ~ 10-100 . When a photon of energy (h) penetrates the surface of a solid it is absorbed by an electron.
The work function is a correction factor for the instrument and correlates to the minimum energy required to eject an electron from an atom (see the photoelectric effect for more info, but not necessary to understand this).

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