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hello everyone Iamp;#39;m Mike LaSalle with summer and thereamp;#39;s a lot of interest with EUV lithography as an enabling technology for the semiconductor industry ciphers were all is making the UV sources and thereamp;#39;s a lot of interest in UV lithography and UV sources so today Iamp;#39;ll give a very brief introduction to how an e UV source works so first if we look at what UV lithography is it is a much shorter wavelength lithography so itamp;#39;s targeting a wavelength of about 13 point 5 nanometers compared to the 193 nanometers of today that short wavelength and the diffraction limited imaging performance provides very very good quality of imaging on the wafer itself however the short wavelengths also have a couple problems as well associated with how do you make 13.5 nanometer light which Iamp;#39;ll talk about today as well as the fact that once we generate the e V light it bounces off a number of optics in the illuminator and the projection optics and the reticle
