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all right so letamp;#39;s examine something i talked a little bit uh earlier about which is the depth profiling so letamp;#39;s look at that a little further so we use the ion gun right to do this those ions typically are gone so itamp;#39;s a the source is basically um we have uh argon that becomes charged to have argon plus we bombard the sample with that and then those charged ions basically collide with the surface and dislodge atoms ions and clusters from the sample we use that to clean the the surface but we can also use that to remove uh material from our sample and so the idea here is that we sputter you know to clean the surface and then we obtain an xps scan so like a survey or particular regions uh carbon oxygen phosphorus any of those regions and then we sputter again and we then cycle through this we go through this process of sputtering and then obtaining a scan and then sputtering again and obtaining the scan and what thatamp;#39;s doing is itamp;#39;s going further
