Conceal inscription in XPS

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Aug 6th, 2022
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How to conceal inscription in XPS

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this video is an introduction to creating peak models and how they apply to xps data and during the course of this video we should provide answers to questions such as these why create a peak model in the first place how does one create a peak model what is a component and do i need to use constraints when fitting a peak model to data the first question is why do we need peak models and this is an example where a peak model is an essential part of understanding the material properties this is a sample that contains aluminium and copper and because it has been measured using an aluminium k alpha x-ray source which is very common for most lab-based systems the aluminium signal arrives only in the form of 2s and aluminium 2p and the problem is that copper 3s and copper 3p overlap with the aluminium signal and then on top of this there may be different oxidation states of aluminium or even different oxidation states of copper and in order to separate different oxidation states then a peak

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The main cause of the peak shift in XPS spectra is mostly related to chemical shifts due to the presence or absence of the chemical states of the element having different formal oxidation state. And the intensity may also be changed bcos it is directly linked to the number of atoms in the respective chemical state.
This chemical shift is dependent on the electronegativity (electron withdrawing power) of atoms bonded to carbon. Oxygen having more electron withdrawing power than carbon or hydrogen results in an increase in the C-O binding energy relative to C-C. Multiple bonds to electronegative atoms as in O-C=O.
therefore, binding energy peak shifts positively. Conversely, if the electronegativity of the doping element is lower than the base element, the electron density around it increases and the binding energy decreases, leading a red shift in BE peak position.
The shifts in the XPS peak is related to its oxidation state and higher shift in binding energy corresponds to higher oxidation state. Some times more shift with noise peak is related to the satellite peak or shake up and it is a case for only some metal or its oxide for example Ni or NiO.
The blue curve indicates a 5-year derivative. The strength of the XPS technique relies on that the chemical environment of an atom has a pronounced effect on the assessed binding energies (BEs) of core-level electrons, the effect commonly referred to as the chemical shift [2].
Sputter ion gun (argon ion gun, cluster ion gun) Since the information depth measurable with XPS is in the range of several nms from the surface, when the surface contamination layer is thick, or when evaluating a deeper area, ion sputtering is used to perform surface etching.

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