Clean PII in XPS smoothly

Aug 6th, 2022
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How to Clean PII in XPS

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hello friends welcome to the second part of the complete series on photoemission spectroscopy in the previous video we have seen the basic principles and instrumentation of xps if you have missed that video you can find the link for the first video in description box now lets talk about the spectra obtained from the xps instrument we have seen that the instrument gives a plot of kinetic energy versus the number of electrons counted so number of electrons counted is plotted in y-axis and kinetic energy is plotted in x-axis so now you can see that it starts from the lower kinetic energy in the left and goes to higher kinetic energy in right as normally a graph is plotted but in most of the modern instruments kinetic energy is converted to binding energy with the formula h nu is equals to binding energy plus kinetic energy plus phi therefore the lower kinetic energy becomes higher binding energy and higher kinetic energy becomes lower binding energy this means now x-axis starts from hig

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All mass spectrometers operate at very low pressure (high vacuum). This reduces the chance of ions colliding with other molecules in the mass analyzer. Any collision can cause the ions to react, neutralize, scatter, or fragment.
The peak shape and precise position indicates the chemical state for the element. XPS is a surface sensitive technique because only those electrons generated near the surface escape and are detected. The photoelectrons of interest have relatively low kinetic energy.
UHV is necessary for these applications to reduce surface contamination, by reducing the number of molecules docHubing the sample over a given time period. At 0.1 millipascals (7.5107 Torr), it only takes 1 second to cover a surface with a contaminant, so much lower pressures are needed for long experiments.
XPS study from a clean surface of Al2O3 single crystals From the results, we found that the XPS spectra of Al-2s and O-1s core levels from the clean surface of Al2O3 single crystals, which has not elements except Al and oxygen, and an ideal stoichiometry of Al2O3, were obtained.
XPS requires high vacuum (residual gas pressure p ~ 106 Pa) or ultra-high vacuum (p 107 Pa) conditions, although a current area of development is ambient-pressure XPS, in which samples are analyzed at pressures of a few tens of millibar.
XPS measurements are conducted under ultra-high vacuum ( 10- 8 Torr) in order to avoid collision between photoelectrons and gas molecules in the spectrometer, and minimize surface contamination from residual gases.
In high vacuum systems, the most important source of problem in the vacuum process is the gases that are expelled from the surfaces of objects in the vacuum chamber, which is called outgassing.
The most prevalent electron spectrometer for XPS is the hemispherical electron analyzer. They have high energy resolution and spatial selection of the emitted electrons.

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